Growth studies of Ge-islands for enhanced performance of thin film solar cells

被引:24
作者
Konle, J [1 ]
Presting, H
Kibbel, H
Banhart, F
机构
[1] Daimler Chrysler Res Ctr, D-89013 Ulm, Germany
[2] Univ Ulm, Zent Einrichtung Elektronenmikroskopie, D-89069 Ulm, Germany
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2002年 / 89卷 / 1-3期
关键词
SiGe; solar cells; quantum dots; Stranski-Krastanow; AFM;
D O I
10.1016/S0921-5107(01)00824-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have studied the self organized growth of Ge-islands on Si-substrates in the Stranski Krastanow growth mode with Si MBE for use in thin Mm solar cells. For samples with high Ge concentrations and high crystal quality, the increased infrared absorption of the SiGe-islands incorporated in the base material of a Si solar cell should overcome the reduced open circuit voltage due to the lower band gap. Series with growth temperatures from 500-700 degreesC and different Ge-coverage have been grown to optimize Ge island/dome formation and crystal quality of single and multiple island layers. Photoluminescence measurements, atomic force and transmission electron microscopy exhibit optimized three dimensional growth at temperatures approximate to 650 degreesC and eight mono layers Ge coverage. In addition, the use of Sb as surfactant during Ge-island growth was studied intensively. Highly ordered Ge-islands with lateral densities up to 1.10(11) cm(-2) were grown at temperatures approximate to 700 degreesC. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:160 / 165
页数:6
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