Low Temperature Deposition of Antibacterially Active Silicon Oxide Layers Containing Silver Nanoparticles, Prepared by Atmospheric Pressure Plasma Chemical Vapor Deposition

被引:45
作者
Beier, Oliver [1 ]
Pfuch, Andreas [1 ]
Horn, Kerstin [1 ]
Weisser, Juergen [1 ]
Schnabelrauch, Matthias [1 ]
Schimanski, Arnd [1 ]
机构
[1] INNOVENT EV Technol Dev Jena, D-07745 Jena, Germany
关键词
antibacterial coatings; cold plasma; plasma jet; silicon oxide; silver; FILMS; IONS;
D O I
10.1002/ppap.201200059
中图分类号
O59 [应用物理学];
学科分类号
摘要
This study presents investigations to create antibacterially active thin films by using the atmospheric pressure plasma chemical vapor deposition technique. Silver nitrate solutions are sprayed and converted within the plasma to create and implement formed silver nanoparticles into a growing SiOx-matrix in situ during the deposition step. Investigation of the films on their bactericidal activity using an Escherichia coli (E. coli) strain shows a strong antibacterial effect of the coatings and additionally a good stability against abrasive wear. The films are characterized by X-ray photoelectron spectroscopy, SEM, energy dispersive X-ray spectroscopy, and IR spectroscopy.
引用
收藏
页码:77 / 87
页数:11
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