Mechanical Properties of Cu2O Thin Films by Nanoindentation

被引：58

作者：

Jian, Sheng-Rui ^{[1
]}

Chen, Guo-Ju ^{[1
]}

Hsu, Wei-Min ^{[1
]}

机构：

[1] I Shou Univ, Dept Mat Sci & Engn, Kaohsiung 84001, Taiwan

来源：

MATERIALS | 2013年 / 6卷 / 10期

关键词：

Cu2O thin film; XRD; AFM; SEM; nanoindentation; hardness; GAN; MODULUS;

D O I：

10.3390/ma6104505

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this study, the structural and nanomechanical properties of Cu2O thin films are investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and nanoindentation techniques. The Cu2O thin films are deposited on the glass substrates with the various growth temperatures of 150, 250 and 350 degrees C by using radio frequency magnetron sputtering. The XRD results show that Cu2O thin films are predominant (111)-oriented, indicating a well ordered microstructure. In addition, the hardness and Young's modulus of Cu2O thin films are measured by using a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM) option. Results indicated that the hardness and Young's modulus of Cu2O thin films decreased as the growth temperature increased from 150 to 350 degrees C. Furthermore, the relationship between the hardness and films grain size appears to closely follow the Hall-Petch equation.

引用

页码：4505 / 4513

页数：9

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