A 32 kb 10T Sub-Threshold SRAM Array With Bit-Interleaving and Differential Read Scheme in 90 nm CMOS

被引:311
作者
Chang, Ik Joon
Kim, Jae-Joon
Park, Sang Phill
Roy, Kaushik
机构
[1] School of Electrical and Computer Engineering, Purdue University, West Lafayette
[2] IBM T. J. Watson Research Center, Yorktown Heights
关键词
Low voltage SRAM design; robust subthreshold operation of SRAM; voltage scaling in SRAM;
D O I
10.1109/JSSC.2008.2011972
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ultra-low voltage operation of memory cells has become a topic of much interest due to its applications in very low energy computing and communications. However, due to parameter variations in scaled technologies, stable operation of SRAMs is critical for the success of low-voltage SRAMs. It has been shown that conventional 6T SRAMs fail to achieve reliable subthreshold operation. Hence, researchers have considered different configuration SRAMs for subthreshold operations having single-ended 8T or 10T bit-cells for improved stability. While these bit-cells improve SRAM stability in subthreshold region significantly, the single-ended sensing methods suffer from reduced bit-line swing due to bit-line leakage noise. In addition, efficient bit-interleaving in column may not be possible and hence, the multiple-bit soft errors can be a real issue. In this paper, we propose a differential 10T bit-cell that effectively separates read and write operations, thereby achieving high cell stability. The proposed bit-cell also provides efficient bit-interleaving structure to achieve soft-error tolerance with conventional Error Correcting Codes (ECC). For read access, we employ dynamic DCVSL scheme to compensate bitline leakage noise, thereby improving bitline swing. To verify the proposed techniques, a 32 kb array of the proposed 10T bit-cell is fabricated in 90 nm CMOS technology. The hardware measurement results demonstrate that this bit-cell array successfully operates down to 160 mV. For leakage power comparison, we also fabricated 49 kb arrays of the 6T and the proposed 10T bit-cells. Measurement results show that the leakage power of the proposed bit-cell is close to that of the 6T (between 0.96x and 1.22x of 6T).
引用
收藏
页码:650 / 658
页数:9
相关论文
共 14 条
[1]   Intrinsic parameter fluctuations in decananometer MOSFETs introduced by gate line edge roughness [J].
Asenov, A ;
Kaya, S ;
Brown, AR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (05) :1254-1260
[2]   A 256-kb 65-nm sub-threshold SRAM design for ultra-low-voltage operation [J].
Calhoun, Benton Highsmith ;
Chandrakasan, Anantha P. .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2007, 42 (03) :680-688
[3]  
Hazucha P., 2003, IEDM, p21.5.1
[4]   A 85mV 40nW process-to le rant subthreshold WFIR filter in 130nm technology [J].
Hwang, Myeong-Eun ;
Raychowdhury, Arijit ;
Kim, Keejong ;
Roy, Kaushik .
2007 SYMPOSIUM ON VLSI CIRCUITS, DIGEST OF TECHNICAL PAPERS, 2007, :154-155
[5]  
Ik Joon Chang, 2008, 2008 IEEE International Solid-State Circuits Conference - Digest of Technical Papers, P388
[6]   A 0.2 V, 480 kb subthreshold SRAM with 1 k cells per bitline for ultra-low-voltage computing [J].
Kim, Tae-Hyoung ;
Liu, Jason ;
Keane, John ;
Kim, Chris H. .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2008, 43 (02) :518-529
[7]   A 160 mV robust Schmitt trigger based subthreshold SRAM [J].
Kulkarni, Jaydeep P. ;
Kim, Keejong ;
Roy, Kaushik .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2007, 42 (10) :2303-2313
[8]  
LAGE C, 1993, IEDM
[9]  
MAIZ J, 2003, IEDM DEC
[10]   A 90nm dual-port SRAM with 2.04μm2 8T-thin cell using dynamically-controlled column bias scheme [J].
Nii, K ;
Tsukamoto, Y ;
Yoshizawa, T ;
Imaoka, S ;
Makino, H .
2004 IEEE INTERNATIONAL SOLID-STATE CIRCUITS CONFERENCE, DIGEST OF TECHNICAL PAPERS, 2004, 47 :508-509