Effects of implantation conditions on the roughness of N-implanted α-Fe

被引：2

作者：

Li, WL ^{[1
]}

Fei, WD ^{[1
]}

Sun, Y ^{[1
]}

机构：

[1] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 2002年 / 21卷 / 03期

关键词：

D O I：

10.1023/A:1014773111865

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Effects of implantation conditions on the roughness of N-implanted α-Fe was reported. It was found that the formation of iron nitride enhanced the surface roughness. Results showed that the highest implantation temperature and lowest voltage were most eave to the formation of iron nitrides on the surface.

引用

页码：239 / 241

页数：3

共 7 条

[1] PLASMA IMMERSION ION-IMPLANTATION OF STEELS [J].

COLLINS, GA ;

HUTCHINGS, R ;

TENDYS, J .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 :171-178

[2] SHEATH THICKNESS AND POTENTIAL PROFILES OF ION-MATRIX SHEATHS FOR CYLINDRICAL AND SPHERICAL ELECTRODES [J].

CONRAD, JR .

JOURNAL OF APPLIED PHYSICS, 1987, 62 (03) :777-779

[3] Dynamic scaling in growth of platinum films on Si(100) [J].

Dharmadhikari, CV ;

Ali, AO ;

Suresh, N ;

Phase, DM ;

Chaudhari, SM ;

Ganesan, V ;

Gupta, A ;

Dasannacharya, BA .

SOLID STATE COMMUNICATIONS, 2000, 114 (07) :377-381

[4] Plasma-based low-energy ion implantation for low-temperature surface engineering [J].

Lei, MK ;

Zhang, ZL ;

Ma, TC .

SURFACE & COATINGS TECHNOLOGY, 2000, 131 (1-3) :317-325

[5]

LIU L, IN PRESS J CHEM U CH

[6] SI/SIO2 INTERFACE STUDIES BY SPECTROSCOPIC IMMERSION ELLIPSOMETRY AND ATOMIC-FORCE MICROSCOPY [J].

LIU, Q ;

WALL, JF ;

IRENE, EA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (05) :2625-2629

[7] PLASMA IMMERSION ION-IMPLANTATION USING PLASMAS GENERATED BY RADIO-FREQUENCY TECHNIQUES [J].

TENDYS, J ;

DONNELLY, IJ ;

KENNY, MJ ;

POLLOCK, JTA .

APPLIED PHYSICS LETTERS, 1988, 53 (22) :2143-2145

← 1 →