Influence of processing parameters on atmospheric pressure plasma etching of polyvinyl alcohol films

被引：0

作者：

Peng, Shujing ^{[1
]}

Qiu, Yiping ^{[2
]}

机构：

[1] Liaoning Univ Technol, Sch Chem & Environm Engn, Liaoning 121001, Peoples R China

[2] Donghua Univ, Coll Text, Shanghai 201620, Peoples R China

来源：

MATERIALS AND MANUFACTURING, PTS 1 AND 2 | 2011年 / 299-300卷

关键词：

Atmospheric pressure plasma; Moisture regain; Polyvinyl alcohol; Etching; Surface roughness; DISCHARGE; SURFACE;

D O I：

10.4028/www.scientific.net/AMR.299-300.608

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper investigated the influence of various processing parameters of atmospheric pressure plasma jet (APPJ) on the etching behavior of PVA films. The etching rate increased as output power, and moisture regain increased. As the treatment time increased, the etching rate increased initially and then decreased. Atomic force microscopy (AFM) results showed that the surface roughness varied as the moisture regain (MR) (2.45%, 9.32%, and 78.31%, respectively) of PVA films changed during APPJ treatment. It was found that higher moisture regain and lower thermal conduction of underlayer had negative effect on the solubility of plasma treated PVA films.

引用

页码：608 / +

页数：2

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