The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

被引：56

作者：

O'Connell, D. ^{[1
]}

Gans, T. ^{[1
]}

Semmler, E. ^{[2
]}

Awakowicz, P. ^{[2
]}

机构：

[1] Queens Univ Belfast, Ctr Plasma Phys, Belfast BT7 1NN, Antrim, North Ireland

[2] Ruhr Univ Bochum, Ctr Plasma Sci & Technol, Inst Elect Engn & Plasma Technol, D-44780 Bochum, Germany

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 08期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1063/1.2972117

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies. (C) 2008 American Institute of Physics.

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页数：3

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