Oxidation Transitions for SiC Part I. Active-to-Passive Transitions

被引:114
|
作者
Jacobson, Nathan [1 ]
Harder, Bryan [1 ]
Myers, Dwight [2 ]
机构
[1] NASA Glenn Res Ctr, Cleveland, OH 44135 USA
[2] E Cent Univ, Ada, OK 74820 USA
关键词
HIGH-TEMPERATURE OXIDATION; SILICON-CARBIDE; PRESSURE; OXYGEN; NITRIDE; HELIUM; AIR;
D O I
10.1111/jace.12108
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Oxidation of SiC can occur in a passive mode where a protective film is generated or in an active mode where a volatile suboxide is generated and can lead to rapid material consumption. The transition between these two modes of oxidation is a critical issue. Evidence indicates that this transition occurs via a different mechanism for the active-to-passive transition as compared with that of the passive-to-active transition. In Part I of this article, the former (active-to-passive mode) is explored. Three different types of SiC are examined: Si-rich SiC, stoichiometric SiC, and C-rich SiC. Evidence suggests that the SiO2/SiC equilibrium requirements as well as formation of SiO(g) at the SiC surface and subsequent oxidation to SiO2(s) are critical issues in the active-to-passive transition.
引用
收藏
页码:838 / 844
页数:7
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