Control of cathodic arc spot motion under external magnetic field

被引：13
|
作者：
Li, Liuhe [1 ]
Zhu, Ying [1 ]
He, Fushun [1 ]
Dun, Dandan [1 ]
Li, Fen [1 ]
Chu, Paul K. [2 ]
Li, Jianzhang [3 ]
机构：
[1] Beihang Univ, Dept 702, Sch Mech Engn & Automat, Beijing, Peoples R China
[2] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
[3] Changan Univ, Fac Mechatron, Xian, Peoples R China
来源：
VACUUM | 2013年 / 91卷
基金：
美国国家科学基金会;
关键词：
Cathode spot; Arc control; Etched pattern; Transverse magnetic field; LOW-PRESSURE ARC; VACUUM;
D O I：
10.1016/j.vacuum.2012.10.008
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A closed circular transverse magnetic field is designed to control the spot motion of a cathodic arc on a large rectangular target. Stable and controllable spot motion is observed from both graphite and copper. The arc stability, spot velocity, and etched pattern on the cathode surface are studied systematically. Circular tracks are etched on the target surface by the repetitive spot movement and the surface morphology and resistivity of the cathode materials influence the spot velocity. (c) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码：20 / 23
页数：4
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