Optical emission spectroscopy diagnosis on decomposition of NO in NO/N2 mixtures in dielectric barrier discharge plasma

被引：12

作者：

Liu, J ^{[1
]}

Niu, JH ^{[1
]}

Xu, Y ^{[1
]}

Zhu, AM ^{[1
]}

Sun, Q ^{[1
]}

Nie, LH ^{[1
]}

机构：

[1] Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China

来源：

ACTA PHYSICO-CHIMICA SINICA | 2005年 / 21卷 / 12期

关键词：

atmospheric pressure; dielectric barrier discharge; plasma; NO; nitrogen atom; optical emission spectroscopy; MS;

D O I：

10.3866/PKU.WHXB20051205

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The optical emission spectroscopy of NO/N-2 in dielectric barrier discharge (DBD) plasmas using a. c. with frequeucies of 50 Hz and 5 kHz has been studied at atmospheric pressure. Excited-state nitrogen atom was detected at 632, 674.5, 715.5 and 742 nm. The concentrations of the mixtures were measured by using chemilluminescence NOx analyzer and N2O infrared gas analyzer; the production Of 02 was also monitored by an on-line mass spectrograph after the discharge. The reaction mechanism of the removal of NO in N-2 in DBD plasma was discussed.

引用

页码：1352 / 1356

页数：5

共 29 条

[1] EVALUATED KINETIC AND PHOTOCHEMICAL DATA FOR ATMOSPHERIC CHEMISTRY .3. IUPAC SUBCOMMITTEE ON GAS KINETIC DATA EVALUATION FOR ATMOSPHERIC CHEMISTRY [J].

ATKINSON, R ;

BAULCH, DL ;

COX, RA ;

HAMPSON, RF ;

KERR, JA ;

TROE, J .

JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1989, 18 (02) :881-1097

[2] EVALUATED KINETIC AND PHOTOCHEMICAL DATA FOR ATMOSPHERIC CHEMISTRY SUPPLEMENT-IV - IUPAC SUBCOMMITTEE ON GAS KINETIC DATA EVALUATION FOR ATMOSPHERIC CHEMISTRY [J].

ATKINSON, R ;

BAULCH, DL ;

COX, RA ;

HAMPSON, RF ;

KERR, JA ;

TROE, J .

JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (06) :1125-1568

[3] Determination of the nitrogen atom density in the afterglow of a nitrogen and helium, nonequilibrium, atmospheric pressure plasma [J].

Babayan, SE ;

Ding, G ;

Hicks, RF .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 2001, 21 (04) :505-521

[4] Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy [J].

Clay, KJ ;

Speakman, SP ;

Amaratunga, GAJ ;

Silva, SRP .

JOURNAL OF APPLIED PHYSICS, 1996, 79 (09) :7227-7233

[5] ELECTRON-IMPACT DISSOCIATION OF NITROGEN [J].

COSBY, PC .

JOURNAL OF CHEMICAL PHYSICS, 1993, 98 (12) :9544-9553

[6] Coupling of chemical kinetics, gas dynamics, and charged particle kinetics models for the analysis of NO reduction from flue gases [J].

Eichwald, O ;

Yousfi, M ;

Hennad, A ;

Benabdessadok, MD .

JOURNAL OF APPLIED PHYSICS, 1997, 82 (10) :4781-4794

[7] Influence of water on NO removal by pulsed discharge in N2/H2O/NO mixtures [J].

Fresnet, F ;

Baravian, G ;

Magne, L ;

Pasquiers, S ;

Postel, C ;

Puech, V ;

Rousseau, A .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (02) :152-160

[8]

GOLDE MF, 1988, INT J CHEM KINETICS, V75

[9] Removal processes of nitric oxide along positive streamers observed by laser-induced fluorescence imaging spectroscopy [J].

Hazama, H ;

Fujiwara, M ;

Tanimoto, M .

CHEMICAL PHYSICS LETTERS, 2000, 323 (5-6) :542-548

[10] Chemical kinetics database and predictive schemes for nonthermal humid air plasma chemistry. Part II. Neutral species reactions [J].

Herron, JT ;

Green, DS .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 2001, 21 (03) :459-481

← 1 2 3 →