The properties of graphene strongly depend on its thickness. It is important to understand the graphene-metal interaction to control its thickness during its growth on metal surfaces. Here, we used the DFT-D2 method of Grimme, which includes the critical long-range van der Waals forces in the graphene-metal interaction, to study the interfaces between mono-, bi-, and trilayer graphene and Cu and Ni (111) surfaces. Our results show the adsorption energy increases with the increase of graphene layers on Ni (111); in contrast, it decreases on Cu (111). Charge density and partial density of states analyses show that monolayer graphene adsorbed on Ni (111) is more reactive than that on Cu (111). Another graphene layer can be easily formed on top of monolayer or bilayer graphene adsorbed on Ni (111); but not on Cu (111). These findings provide a useful guide for achieving precise layer controlled graphene growth and designing graphene based devices.
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
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机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
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h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
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h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
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机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
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Hone, J.
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h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
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Kim, P.
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h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
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h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
;
Hone, J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
;
Kim, P.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA