High-gravity-assisted pulsed laser ablation system for the fabrication of functionally graded material thin film

被引:4
作者
Nishiyama, T. [1 ]
Morinaga, S. [1 ]
Nagayama, K. [1 ]
机构
[1] Kyushu Univ, Dept Aeronaut & Astronaut, Fac Engn, Nishi Ku, Fukuoka 8190395, Japan
关键词
functionally graded materials; iron compounds; pulsed laser deposition; semiconductor growth; semiconductor materials; semiconductor thin films; ULTRACENTRIFUGE APPARATUS; HIGH-TEMPERATURE; DEPOSITION; GROWTH;
D O I
10.1063/1.3095559
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This paper describes a novel method for the fabrication of a thin film deposited on an appropriate substrate having a continuous composition gradient. The composition gradient was achieved by a combination of pulsed laser ablation (PLA) of the target material with a very strong acceleration field generated on a moving disk rotating at a very high speed. The PLA process was used to produce a cloud of high-energy particles of the target material that will be deposited on a substrate placed on the rotating disk. After deposition, the particles will diffuse on the surface of the thin film under a strong acceleration field. The high energy of the particles and their diffusion on the substrate surface in a high-vacuum environment produces a macroscopic composition distribution in the thin film. We have constructed an experimental apparatus consisting of a vacuum chamber in which a circular disk made of titanium is driven by a high-frequency inductive motor. An acceleration field of up to 10 000 G can be generated by this apparatus. Functionally graded material thin films of FeSi(2) with a continuous concentration gradient were successfully fabricated by this method under a gravity field of 5400 G. A significant advantage of this method is that it allows us to fabricate graded thin films with a very smooth surface covered by few droplets.
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页数:6
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