193-nm-laser-induced spectral shift in HR coated mirrors

被引：0
作者：
Cho, Byungil [1 ]
Rudisill, J. Earl [1 ]
Danielewicz, Edward [1 ]
机构：
[1] Newport Corp, Irvine, CA 92606 USA
来源：
OPTICAL ENGINEERING | 2012年 / 51卷 / 12期
关键词：
193-nm; laser induced; spectral shift; fluoride; high-reflectance mirror; densification; compaction; crystallization; FUSED-SILICA; LASER; DAMAGE;
D O I：
10.1117/1.OE.51.12.121804
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
High-reflectance mirrors, fabricated by use of fluoride coating materials, were irradiated for extended periods by a 193-nm kilohertz repetitive laser source. This irradiation promoted a spectral shift in the reflectance band towards shorter wavelengths. In efforts to determine the mechanism for the observed spectral shifts, various models were investigated by employing such techniques as spectrophotometry, surface profile interferometry, coating design simulation, and x-ray diffraction. The result of the investigation indicates that layers near the top surface of the coating structure underwent densification, which resulted in the observed spectral shift. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI:10.1117/1.OE.51.12.121804]
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页数：6
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