A comparative study on the structure and properties of nanolayered TiN/NbN and TiAlN/TiN multilayer coatings prepared by reactive direct current magnetron sputtering

被引:52
作者
Barshilia, HC
Rajam, KS
Jain, A
Gopinadhan, K
Chaudhary, S
机构
[1] Natl Aerosp Labs, Surface Engn Div, Bangalore 560017, Karnataka, India
[2] Natl Aerosp Labs, Div Mat Sci, Bangalore 560017, Karnataka, India
[3] Indian Inst Technol, Dept Phys, New Delhi 110016, India
关键词
sputtering; multilayers; hard coatings; hardness; titanium nitride; niobium nitride; X-ray diffraction;
D O I
10.1016/j.tsf.2005.12.074
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at various modulation wavelengths (i.e. bilayer thickness, A) using a reactive direct current magnetron sputtering system. These coatings were characterized using X-ray diffraction (XRD), X-ray reflectivity, nanoindentation tester and micro-Raman spectroscopy. For TiN/NbN multilayer coatings, at low A, the XRD data showed well-resolved first-order negative satellite reflection along (I 11) principal reflection, whereas, a weak first-order positive satellite reflection was observed for TiAlN/TiN multilayer coatings. Similarly, the X-ray reflectivity data showed well-resolved satellite reflections of second-orders for TiN/NbN multilayer coatings and diffused satellite reflections for TiAlN/TiN multilayer coatings, indicating broad interfaces for TiAlN/TiN multilayers. TiN/NbN and TiAlN/TiN multilayers showed maximum nanoindentation hardness values of 4000 and 3750 kg/mm(2), respectively. Single layer coatings of TiN, NbN and TiAlN showed hardness values of 2600, 1800 and 3850 kg/mm(2), respectively. The low hardness of TiAlN/TiN multilayers; is attributed to diffused interfaces. Raman spectroscopy measurements on the multilayer coatings after heat treatment in air showed that TiN/NbN multilayers were thermally stable (with respect to oxidation) up to 500 degrees C, whereas TiAlN/TiN multilayers were stable up to 800 degrees C. The nanoindentation measurements performed on the heat-treated coatings showed that TiN/NbN multilayer hardness reduced to about 2000 kg/mm(2) after heating up to 600 degrees C. On the other hand, TiAlN/TiN multilayers retained hardness as high as 2500 kg/mm(2) even after heating up to 700 degrees C. (c) 2005 Elsevier B.V All rights reserved.
引用
收藏
页码:158 / 166
页数:9
相关论文
共 50 条
  • [41] Influence of Ni content on the structure and properties of Cr-Ni-N coatings prepared by direct current magnetron sputtering
    Zhang, Z. G.
    Rapaud, O.
    Allain, N.
    Mercs, D.
    Brien, V.
    Dong, C.
    Coddet, C.
    THIN SOLID FILMS, 2009, 517 (11) : 3304 - 3309
  • [42] Tribological properties and microstructure of monolayer and multilayer Ta coatings prepared by magnetron sputtering
    Su, Yongyao
    Huang, Weijiu
    Zhang, Tengfei
    Shi, Chunbao
    Hu, Rong
    Wang, Zhenguo
    Cai, Lixin
    VACUUM, 2021, 189
  • [43] Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings
    Subramanian, B.
    Ananthakumar, R.
    Jayachandran, M.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 (11) : 3485 - 3492
  • [44] Electrochemical behavior of superhard nanocomposite coatings of TiN/Si3N4 prepared by reactive DC unbalanced magnetron sputtering
    Selvi, V. Ezhil
    Grips, V. K. William
    Barshilia, Harish C.
    SURFACE & COATINGS TECHNOLOGY, 2013, 224 : 42 - 48
  • [45] Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering
    Kauffmann, F
    Dehm, G
    Schier, V
    Schattke, A
    Beck, T
    Lang, S
    Arzt, E
    THIN SOLID FILMS, 2005, 473 (01) : 114 - 122
  • [46] Microstructure and mechanical properties of TiN/TiAlN multilayer coatings deposited by arc ion plating with separate targets
    Wei Yong-qiang
    Li Chun-wei
    Gong Chun-zhi
    Tian Xiu-bo
    Yang Shi-qin
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2011, 21 (05) : 1068 - 1073
  • [47] PROPERTIES OF TIN HARD COATINGS PREPARED BY UNBALANCED MAGNETRON SPUTTERING AND CATHODIC ARE DEPOSITION USING A UNIPOLAR AND BIPOLAR PULSED BIAS VOLTAGE
    GRIEPENTROG, M
    MACKRODT, B
    MARK, G
    LINZ, T
    SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3) : 326 - 332
  • [48] Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering
    Xian, Guang
    Zhao, Hai-Bo
    Fan, Hong-Yuan
    Du, Hao
    RARE METALS, 2015, 34 (10) : 717 - 724
  • [49] Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering
    Guang Xian
    Hai-Bo Zhao
    Hong-Yuan Fan
    Hao Du
    RareMetals, 2015, 34 (10) : 717 - 724
  • [50] Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering
    Guang Xian
    Hai-Bo Zhao
    Hong-Yuan Fan
    Hao Du
    Rare Metals, 2015, 34 : 717 - 724