Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane

被引：5
作者：
Pola, J
Bastl, Z
Ouchi, A
Subrt, J
Morita, H
机构：
[1] Acad Sci Czech Republ, Inst Chem Proc Fundamentals, CR-16502 Prague, Czech Republic
[2] Acad Sci Czech Republ, J Heyrovsky Inst Phys Chem, CR-18223 Prague, Czech Republic
[3] Natl Inst Mat & Chem Res, Tsukuba, Ibaraki 3058565, Japan
[4] Acad Sci Czech Republ, Inst Inorgan Chem, CZ-25068 Rez, Czech Republic
[5] Chiba Univ, Grad Sch Sci & Technol, Chiba 263, Japan
来源：
SURFACE & COATINGS TECHNOLOGY | 2002年 / 149卷 / 2-3期
基金：
日本科学技术振兴机构;
关键词：
polycarbosilane films; laser; chemical vapour deposition; ethynyltrimethylsilane;
D O I：
10.1016/S0257-8972(01)01495-5
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
ArF laser-induced polymerization of gaseous ethynyltrimethylsilane at atmospheric pressure of He represents a convenient way of efficient chemical vapour deposition of polycarbosilane films. The films are produced at ambient temperature of metals, quartz and glass, and are adhesive to these substrates, which makes this process promising for fabrication of protective coatings on thermally unstable surfaces. (C) 2002 Elsevier Science B.V All rights reserved.
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页码：129 / 134
页数：6
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