Optimization of fabrication process of high-efficiency and low-cost crystalline silicon solar cell for industrial applications

被引：44
作者：
Lee, Jaehyeong [2 ]
Lakshminarayan, N. [1 ,3 ]
Dhungel, Suresh Kumar [1 ]
Kim, Kyunghae [1 ]
Yi, Junsin [1 ]
机构：
[1] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, Kyeonggi Do, South Korea
[2] Kunsan Natl Univ, Sch Elect & Informat Engn, Kunsan 573701, Jeobuk, South Korea
[3] Madras Christian Coll, Dept Phys, Madras, Tamil Nadu, India
来源：
SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2009年 / 93卷 / 02期
关键词：
Solar cell; Crystalline silicon; High efficiency; Process optimization;
D O I：
10.1016/j.solmat.2008.10.013
中图分类号：
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号：
0807 ; 0820 ;
摘要：
The process conditions for a high-efficiency and low cost crystalline silicon solar cell were optimized. Novel approaches such as wafer cleaning and saw -damage removal using 0.5wt% of 2,4,6-trichloro-1,3,5-triazine, silicon surface texturing with optimized pyramid heights (similar to 5 mu m), and a third step of drive-in after phosphosilicate glass (PSG) removal followed by oxide removal were investigated. A simple method of chemical etching adopted for edge isolation was optimized with edge etching of 5-10 mu m, without any penetration of chemicals between the stacked wafers. The conversion efficiency, open-circuit voltage, short-circuit current, and fill factor of the cell fabricated with the optimized process were a maximum of 17.12%, 618.4 mV, 5.32 A, and 77% under AM1.5 conditions, respectively. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：256 / 261
页数：6
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