Non-equilibrium character of resistive switching and negative differential resistance in Ga-doped Cr2O3 system

被引:12
作者
Bhowmik, R. N. [1 ]
Siva, K. Venkata [1 ]
机构
[1] Pondicherry Univ, Dept Phys, Pondicherry 605014, India
关键词
Resistive switching; Negative differential resistance; Charge relaxation; Bi-stable electronic states; THIN-FILM; METAL-OXIDES; MEMORY; ALPHA-FE2O3;
D O I
10.1016/j.jmmm.2018.02.070
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The samples of Ga-doped Cr2O3 system in rhombohedral crystal structure with space group R (3) over barC were prepared by chemical co-precipitation route and annealing at 800 degrees C. The current-voltage (I-V) curves exhibited many unique non-linear properties, e.g., hysteresis loop, resistive switching, and negative differential resistance (NDR). In this work, we report non-equilibrium properties of resistive switching and NDR phenomena. The non-equilibrium I-V characteristics were confirmed by repetiting measurement and time relaxation of current. The charge conduction process was understood by analysing the I-V curves using electrode-limited and bulk-limited charge conduction mechanisms, which were proposed for metal electrode/metal oxide/metal electrode structure. The I-V curves in the NDR regime and at higher bias voltage regime in our samples did not obey Fowler-Nordheim equation, which was proposed for charge tunneling mechanism in many thin film junctions. The non-equilibrium I-V phenomena were explained by considering the competitions between the injection of charge carriers from metal electrode to metal oxide, the charge flow through bulk material mediated by trapping/de-trapping and recombination of charge carriers at the defect sites of ions, the space charge effects at the junctions of electrodes and metal oxides, and finally, the out flow of electrons from metal oxide to metal electrode. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:17 / 29
页数:13
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