In situ high-temperature scanning tunneling microscopy study of bilayer graphene growth on 6H-SiC(0001)

被引:3
|
作者
Murata, Yuya [1 ]
Petrova, V. [2 ]
Petrov, I. [2 ]
Kodambaka, S. [1 ]
机构
[1] Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
关键词
Graphene; High-temperature STM; SiC; In-situ microscopy; Growth kinetics; EPITAXIAL-GRAPHENE;
D O I
10.1016/j.tsf.2012.03.040
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using in situ high-temperature (1395 K), ultra-high vacuum, scanning tunneling microscopy (STM), we investigated the growth of bilayer graphene on 6H-SiC(0001). From the STM images, we measured areal coverages of SiC and graphene as a function of annealing time and found that graphene grows at the expense of SiC. Graphene domains were observed to grow, at comparable rates, at (I) graphene-free SiC step edges, (II) graphene-SiC interfaces, and (III) the existing graphene domain edges. Based upon our results, we suggest that the rate-limiting step controlling bilayer graphene growth is the desorption of Si from the substrate. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:5289 / 5293
页数:5
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