Application of an AlGaAs/GaAs/InGaAs heterostructure emitter for a resonant-tunneling transistor

被引:12
作者
Tsai, JH [1 ]
机构
[1] Chien Kuo Inst Technol, Dept Elect Engn, Chang Hua, Taiwan
关键词
D O I
10.1063/1.125113
中图分类号
O59 [应用物理学];
学科分类号
摘要
An AlGaAs/GaAs/InGaAs resonant-tunneling heterostructure-emitter bipolar transistor with negative-differential-resistance (NDR) behavior has been fabricated and demonstrated. Typical device performances with current gain of 140 incorporating an N-shaped NDR with a peak-to-valley current ratio of 5.3 are obtained at room temperature. The NDR behavior is believed to mainly result from a double-barrier-like resonant-tunneling effect. In other words, the on and off electron resonant tunneling from a depleted GaAs emitter through an InGaAs quantum well and ultrathin base toward a collector layer yield the interesting NDR behavior. Consequently, the proposed device provides a good potential for applications in amplifiers, low-power consumption, and logic currents. (C) 1999 American Institute of Physics. [S0003-6951(99)04943-8].
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页码:2668 / 2670
页数:3
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