High-speed deposition of titanium carbide coatings by laser-assisted metal-organic CVD

被引：32

作者：

Gong, Yansheng ^{[1
]}

Tu, Rong ^{[2
]}

Goto, Takashi ^{[3
]}

机构：

[1] China Univ Geosci, Fac Mat Sci & Chem, Wuhan 430074, Peoples R China

[2] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China

[3] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

MATERIALS RESEARCH BULLETIN | 2013年 / 48卷 / 08期

关键词：

Carbides; Laser deposition; High speed deposition; Electron microscopy; Surface properties; CHEMICAL-VAPOR-DEPOSITION; TIC COATINGS; CORROSION BEHAVIOR; FILMS; MICROSTRUCTURE; GROWTH;

D O I：

10.1016/j.materresbull.2013.03.039

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A semiconductor laser-assisted chemical vapor deposition (LCVD) of titanium carbide (TiCx) coatings on Al2O3 substrate using tetrakis (diethylamido) titanium (TDEAT) and C2H2 as source materials were investigated. The influences of laser power (P-L) and pre-heating temperature (T-pre) on the microstructure and deposition rate of TiCx coatings were examined. Single phase of TiCx coatings were obtained at P-L = 100-200W. TiCx coatings had a cauliflower-like surface and columnar cross section. TiCx coatings in the present study had the highest R-dep (54 mu m/h) at a relative low T-dep than those of conventional CVD-TiCx coatings. The highest volume deposition rate (V-dep) of TiCx coatings was about 4.7 x 10(-12) m(3) s(-1), which had 3-10(5) times larger deposition area and 1-4 order lower laser density than those of previous LCVD using CO2, Nd:YAG and argon ion laser. (C) 2013 Elsevier Ltd. All rights reserved.

引用

页码：2766 / 2770

页数：5

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