High-speed deposition of titanium carbide coatings by laser-assisted metal-organic CVD

被引：32
作者：
Gong, Yansheng [1 ]
Tu, Rong [2 ]
Goto, Takashi [3 ]
机构：
[1] China Univ Geosci, Fac Mat Sci & Chem, Wuhan 430074, Peoples R China
[2] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
[3] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
MATERIALS RESEARCH BULLETIN | 2013年 / 48卷 / 08期
关键词：
Carbides; Laser deposition; High speed deposition; Electron microscopy; Surface properties; CHEMICAL-VAPOR-DEPOSITION; TIC COATINGS; CORROSION BEHAVIOR; FILMS; MICROSTRUCTURE; GROWTH;
D O I：
10.1016/j.materresbull.2013.03.039
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A semiconductor laser-assisted chemical vapor deposition (LCVD) of titanium carbide (TiCx) coatings on Al2O3 substrate using tetrakis (diethylamido) titanium (TDEAT) and C2H2 as source materials were investigated. The influences of laser power (P-L) and pre-heating temperature (T-pre) on the microstructure and deposition rate of TiCx coatings were examined. Single phase of TiCx coatings were obtained at P-L = 100-200W. TiCx coatings had a cauliflower-like surface and columnar cross section. TiCx coatings in the present study had the highest R-dep (54 mu m/h) at a relative low T-dep than those of conventional CVD-TiCx coatings. The highest volume deposition rate (V-dep) of TiCx coatings was about 4.7 x 10(-12) m(3) s(-1), which had 3-10(5) times larger deposition area and 1-4 order lower laser density than those of previous LCVD using CO2, Nd:YAG and argon ion laser. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码：2766 / 2770
页数：5
相关论文
共 26 条
[1]  
CONDE O, 1995, P SOC PHOTO-OPT INS, V2461, P95, DOI 10.1117/12.203521
[2]   Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablation of titanium in low-pressure CH4 and C2H2 atmospheres [J].
D'Anna, E ;
Fernández, M ;
Leggieri, G ;
Luches, A ;
Zocco, A ;
Majni, G .
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2004, 28 (02) :159-163
[3]   XPS study of the surface composition modification of nc-TiC/C nanocomposite films under in situ argon ion bombardment [J].
El Mel, A. A. ;
Angleraud, B. ;
Gautron, E. ;
Granier, A. ;
Tessier, P. Y. .
THIN SOLID FILMS, 2011, 519 (12) :3982-3985
[4]   Microstructure and composition of TiC/a-C:H nanocomposite thin films deposited by a hybrid IPVD/PECVD process [J].
El Mel, A. A. ;
Angleraud, B. ;
Gautron, E. ;
Granier, A. ;
Tessier, P. Y. .
SURFACE & COATINGS TECHNOLOGY, 2010, 204 (12-13) :1880-1883
[5]   GROWTH AND STRUCTURE OF TIC COATINGS CHEMICALLY VAPOR-DEPOSITED ON GRAPHITE SUBSTRATES [J].
EROGLU, S ;
GALLOIS, B .
JOURNAL OF MATERIALS SCIENCE, 1995, 30 (07) :1754-1759
[6]   Low Temperature Synthesis and Characterization of Nanocrystalline Titanium Carbide with Tunable Porous Architectures [J].
Flaherty, David W. ;
May, R. Alan ;
Berglund, Sean P. ;
Stevenson, Keith J. ;
Mullins, C. Buddie .
CHEMISTRY OF MATERIALS, 2010, 22 (02) :319-329
[7]   Growth and Characterization of High Surface Area Titanium Carbide [J].
Flaherty, David W. ;
Hahn, Nathan T. ;
Ferrer, Domingo ;
Engstrom, Todd R. ;
Tanaka, Paul L. ;
Mullins, C. Buddie .
JOURNAL OF PHYSICAL CHEMISTRY C, 2009, 113 (29) :12742-12752
[8]   Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system [J].
Gong, Yansheng ;
Tu, Rong ;
Goto, Takashi .
SURFACE & COATINGS TECHNOLOGY, 2010, 204 (14) :2111-2117
[9]   THERMODYNAMIC ANALYSIS FOR THE CHEMICAL VAPOR-DEPOSITION OF NONSTOICHIOMETRIC TITANIUM CARBIDES [J].
GOTO, T ;
JIANG, CC ;
HIRAI, T .
JOURNAL OF THE LESS-COMMON METALS, 1990, 159 (1-2) :231-236
[10]  
GOTO T, 1992, J MATER SCI, V27, P233, DOI 10.1007/BF02403668
123