Comparison of wear and corrosion behaviors of Cr and CrN sputtered coatings

被引：42
作者：
Stockemer, J
Winand, R
Vanden Brande, P
机构：
[1] Free Univ Brussels, Dept Met, B-1050 Brussels, Belgium
[2] Ctr Rech & Dev Grp Cockerill Sambre, B-4000 Liege, Belgium
来源：
SURFACE & COATINGS TECHNOLOGY | 1999年 / 115卷 / 2-3期
关键词：
D O I：
10.1016/S0257-8972(99)00177-2
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Cr and CrN coatings were prepared by d.c. magnetron sputtering in a pure Ar and a N-2-Ar atmospheres, respectively. The N-2-Ar gas composition was chosen in order to allow the production of stoichiometric CrN deposits at the highest possible deposition rate. The columnar growth, low friction coefficient and high hardness of CrN were confirmed for deposits produced at a low temperature. The electrochemical behavior of CrN sputtered deposits in chloride solutions seemed to be similar to the behavior of Cr sputtered deposits. Moreover, it was shown that an anodic polarization treatment of the deposit increases the corrosion resistance of a chromium coating in the presence of chloride ions. (C) 1999 Elsevier Science S.A. All rights reserved.
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页码：230 / 233
页数：4
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