Laser produced plasma for efficient extreme ultraviolet light sources

被引：3

作者：

Donnelly, Tony ^{[1
]}

Cummins, Thomas ^{[1
]}

Gorman, Colm O' ^{[1
]}

Li, Bowen ^{[1
]}

Harte, Colm S. ^{[1
]}

O'Reilly, Fergal ^{[1
]}

Sokell, Emma ^{[1
]}

Dunne, Padraig ^{[1
]}

O'Sullivan, Gerry ^{[1
]}

机构：

[1] Univ Coll Dublin, Sch Phys, Dublin 4, Ireland

来源：

17TH INTERNATIONAL CONFERENCE ON ATOMIC PROCESSES IN PLASMAS (ICAPIP) | 2012年 / 1438卷

关键词：

Laser produced plasma; extreme ultraviolet emission; EUV spectroscopy; EMISSION; TIN;

D O I：

10.1063/1.4707871

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO2 laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO2 laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd2O3 target has been performed and verified.

引用

页码：155 / 160

页数：6

共 13 条

[1]

Badine V., 2010, EUV SOURC WORKSH DUB

[2]

Cummins T., 2011, UNPUB

[3] Efficient laser-produced plasma extreme ultraviolet sources using grooved Sn targets [J].