共 50 条
Electronic properties of dislocations in GaN investigated by scanning tunneling microscopy
被引:30
|作者:
Ebert, Ph.
[1
]
Ivanova, L.
[2
]
Borisova, S.
[1
]
Eisele, H.
[2
]
Laubsch, A.
[3
]
Daehne, M.
[2
]
机构:
[1] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
[2] Tech Univ Berlin, Inst Festkorperphys, D-10623 Berlin, Germany
[3] OSRAM Opto Semicond GmbH, D-93055 Regensburg, Germany
关键词:
dislocation dipoles;
energy gap;
gallium compounds;
III-V semiconductors;
scanning tunnelling microscopy;
stacking faults;
wide band gap semiconductors;
VAPOR-PHASE EPITAXY;
THREADING DISLOCATIONS;
CHARGES;
FILMS;
EDGE;
D O I:
10.1063/1.3073741
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We investigated the type, spatial distribution, line direction, and electronic properties of dislocations in n-type GaN by scanning tunneling microscopy. We found uncharged perfect dislocations with a/3{1120} Burgers vectors and negatively charged Shockley partial dislocations with a/3{1100} Burgers vectors interconnected by a negatively charged stacking fault. The charges are traced to different charge transfer levels associated with the particular core structure.
引用
收藏
页数:3
相关论文