Effect of pH on Structural and Electrical Properties of Electrodeposited Bi2Te3 Thin Films

被引：20

作者：

Suresh, Asaithambi

Chatterjee, Krishanu ^{[1
]}

Sharma, Vijay K. R. ^{[2
]}

Ganguly, Saibal

Kargupta, Kajari ^{[3
]}

Banerjee, Dipali ^{[1
]}

机构：

[1] Bengal Engn & Sci Univ, Dept Phys, Howrah 711103, W Bengal, India

[2] GE Ltd, Bangalore, Karnataka, India

[3] Jadavpur Univ, Dept Chem Engn, Kolkata 700032, India

来源：

JOURNAL OF ELECTRONIC MATERIALS | 2009年 / 38卷 / 03期

关键词：

Electrodeposition; Seebeck coefficient; bismuth telluride; nanostructures; COEVAPORATION; OPTIMIZATION;

D O I：

10.1007/s11664-008-0635-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Bi2Te3 thin films were electrodeposited at various pH values of a bismuth nitrate and tellurium oxide plating solution. Enhancement in pH results in a decrease in grain size. Transmission electron microscopy reveals the transformation of the film morphology from dispersed nanoparticles to connected chain-like nanostructures of Bi2Te3 as pH is increased. Electrical characterization for samples deposited in the temperature range of 300 K to 425 K shows a fourfold increase in Seebeck coefficient, S, between its maximum and minimum value as the solution pH changes from 1 to 3.5. Such enhancement of S is attributed to the increased connectivity of the nanostructures at higher pH.

引用

页码：449 / 452

页数：4

共 21 条

[1] Preparation and characterization of MOCVD bismuth telluride thin films [J].