Enhancement of the light output of GaN-based ultraviolet light-emitting diodes by a one-dimensional nanopatterning process

被引:54
作者
Hong, HG
Kim, SS
Kim, DY
Lee, T
Song, JO
Cho, JH
Sone, C
Park, Y
Seong, TY [1 ]
机构
[1] Korea Univ, Div Mat Sci & Engn, Seoul 136713, South Korea
[2] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[3] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[4] Samsung Adv Inst Technol, Photon Program Team, Suwon 440600, South Korea
关键词
D O I
10.1063/1.2174842
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have demonstrated the enhancement of the output power of ultraviolet GaN-based light-emitting diodes (LEDs) by using one-dimensionally nanopatterned Cu-doped indium oxide(CIO)/indium tin oxide (ITO) p-type contact layers. The one-dimensional (1D) nanopatterns (250 nm in width and 100 nm in depth) are defined using a TiO2 1D nanomask fabricated by means of a surface relief grating technique. When fabricated with the nanopatterned p-contact layers, the output power of LEDs is improved by 40 and 63% at 20 mA as compared to those fabricated with the unpatterned CIO/ITO and conventional Ni/Au contacts, respectively. (c) 2006 American Institute of Physics.
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页数:3
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