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Nanoindentation study on insight of plasticity related to dislocation density and crystal orientation in GaN
被引:40
|作者:
Fujikane, Masaki
[1
]
Yokogawa, Toshiya
[1
]
Nagao, Shijo
[2
]
Nowak, Roman
[3
]
机构:
[1] Panasonic Corp, Corp R&D Div, Device Module Dev Ctr, Moriguchi, Osaka 5708501, Japan
[2] Norwegian Univ Sci & Technol NTNU, Dept Struct Engn, NTNU Nanomech Lab, N-7491 Trondheim, Norway
[3] Aalto Univ, Sch Chem Technol, Dept Mat Sci, Nord Hysitron Lab, FI-00076 Aalto, Finland
关键词:
crystal orientation;
dislocation density;
gallium compounds;
III-V semiconductors;
molecular dynamics method;
nanoindentation;
plastic deformation;
plasticity;
slip;
transmission electron microscopy;
wide band gap semiconductors;
yield stress;
SURFACE DEFORMATION;
MECHANICAL-PROPERTIES;
INDENTATION;
SAPPHIRE;
PLANE;
D O I:
10.1063/1.4767372
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Yield shear stress dependence on dislocation density and crystal orientation was studied in GaN by nanoindentation examination. The yield shear stress decreased with increasing dislocation density, and it decreased with decreasing nanoindentation strain-rate. It reached and coincided at 11.5GPa for both quasi-static deformed c-plane and m-plane GaN. Taking into account theoretical Peierls-Nabarro stress and yield stress for each slip system, these phenomena were concluded to be an evidence of heterogeneous mechanism associated plastic deformation in GaN crystal. Transmission electron microscopy and molecular dynamics simulation also supported the mechanism with obtained r-plane dislocation line. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4767372]
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