Formation of Surface Alloys With a Low-Energy High-Current Electron Beam for Improving High-Voltage Hold-Off of Copper Electrodes

被引:29
作者
Markov, Alexey B. [1 ]
Yakovlev, Evgeny V. [1 ]
Petrov, Vsevolod I. [1 ]
机构
[1] Inst High Current Elect SB RAS, Tomsk 634055, Russia
关键词
Film deposition; high-voltage hold-off; magnetron sputtering; pulsed electron beam; surface alloying; VACUUM BREAKDOWN; IRRADIATION;
D O I
10.1109/TPS.2013.2254501
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Electrical breakdown and tribological properties of multicomponent surface alloys of stainless steel (SS)-Cu formed on Cu substrate with a low-energy high-current electron beam (LEHCEB) of microsecond duration are investigated. Formation of surface alloys is performed using deposition of SS films by means of magnetron sputtering followed by an LEHCEB liquid-phase mixing of the film and the top layer of substrate in a single vacuum cycle. A thickness of formed SS-Cu alloys is ranging within 1-10 mu m. Investigation of electrical breakdown of Cu electrodes with formed SS-Cu surface alloy showed almost three times increase in the high-voltage hold-off (1 MV/cm) compared with that for initial Cu electrodes (0.35 MV/cm). The gained high-voltage hold-off appears to be equal to that for electrodes made of SS and treated with an LEHCEB. Scratch tests revealed the significant improving adhesion of surface alloys to a substrate compared with that for the common magnetron-deposited coating of the same thickness.
引用
收藏
页码:2177 / 2182
页数:6
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