Optical properties and thermal stability of TiAlN/AlON tandem absorber prepared by re active DC/RF magnetron sputtering

被引:107
作者
Barshilia, Harish C. [1 ]
Selvakumar, N. [1 ]
Rajam, K. S. [1 ]
Biswas, A. [2 ]
机构
[1] Natl Aerosp Labs, Surface Engn Div, Bangalore 560017, Karnataka, India
[2] Bhabha Atom Res Ctr, Div Spect, Bombay 400085, Maharashtra, India
关键词
tandem absorber; titanium aluminum nitride; aluminum oxynitride; optical properties; sputtering;
D O I
10.1016/j.solmat.2008.06.004
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Spectrally selective TiAIN/AION tandem absorbers were deposited on copper and stainless steel substrates using a reactive DC/RF magnetron sputtering system. The compositions and thicknesses of the individual component layers were optimized to achieve high absorptance (alpha = 0.931-0.942) and low emittance (epsilon = 0.05-0.06) on copper substrate. The experimental spectroscopic ellipsometric data have been fitted with the theoretical models to derive the dispersion of the optical constants (n and k). In order to study the thermal stability of the tandem absorbers, they were subjected to heat treatment (in air and vacuum) for different durations and temperatures. The tandem absorber deposited on Cu substrates exhibited high solar selectivity (alpha/epsilon) of 0.946/0.07 even after heat treatment in air up to 600 degrees C for 2 h. At 625 degrees C, the solar selectivity decreased significantly on Cu substrates (e.g., alpha/epsilon = 0.924/ 0.30). The tandem absorber on Cu substrates was also stable in air up to 100h at 400 degrees C with a solar selectivity of 0.919/0.06. Studies on the accelerated aging tests indicated that the activation energy for the degradation of the tandem absorber is of the order of 100 kJ/mol. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:1425 / 1433
页数:9
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