Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

被引：12

作者：

Hagiwara, Yuji ^{[1
]}

Mesch, Ryan A. ^{[1
]}

Kawakami, Takanori ^{[2
]}

Okazaki, Masahiro ^{[2
]}

Jockusch, Steffen ^{[3
]}

Li, Yongjun ^{[3
]}

Turro, Nicholas J. ^{[3
]}

Wilson, C. Grant ^{[1
,2
]}

机构：

[1] Univ Texas Austin, Dept Chem, Austin, TX 78712 USA

[2] Univ Texas Austin, Dept Chem Engn, Austin, TX 78712 USA

[3] Columbia Univ, Dept Chem, New York, NY 10027 USA

来源：

JOURNAL OF ORGANIC CHEMISTRY | 2013年 / 78卷 / 05期

基金：

美国国家科学基金会;

关键词：

ACID; REDUCTION;

D O I：

10.1021/jo3021488

中图分类号：

O62 [有机化学];

学科分类号：

070303 ; 081704 ;

摘要：

The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation can lead to improved image quality. This delay can be realized by a PBG that must undergo two sequential photoreactions for each molecule of base generated Toward that end, latent PBGs were designed that are oxime esters of aliphatic acids, which undergo Norrish type II reactions to yield oxime esters of aromatic acids that are efficient PBGs.

引用

页码：1730 / 1734

页数：5

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