Intersubband hole-phonon and alloy disorder scattering in SiGe quantum wells

被引:37
作者
Ikonic, Z [1 ]
Harrison, P [1 ]
Kelsall, RW [1 ]
机构
[1] Univ Leeds, Sch Elect & Elect Engn, Inst Microwaves & Photon, Leeds LS2 9JT, W Yorkshire, England
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 24期
关键词
D O I
10.1103/PhysRevB.64.245311
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using the 6x6 k.p method we calculate hole-phonon and alloy disorder scattering rates in SiGe quantum wells, and how these depend on the various parameters of the system. The relative importance of different branches of nonpolar optical and acoustic phonons is discussed, and a comparison is made with alloy scattering. The latter is found to be an important mechanism for intersubband hole relaxation, particularly for low-energy transitions at low temperatures, where it dominates over phonon scattering, while losing significance in the opposite case, The results are relevant for the design and operation of SiGe-based quantum cascade lasers relying on intersubband transitions in the valence band.
引用
收藏
页数:9
相关论文
共 39 条
[1]   HOLE-PHONON SCATTERING IN STRAINED SIGE QUANTUM-WELLS [J].
BHAUMIK, K ;
RIDLEY, BK ;
SHACHAMDIAMAND, Y .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (09) :5546-5550
[2]   Calculation of hole mobilities in relaxed and strained SiGe by Monte Carlo simulation [J].
Briggs, PJ ;
Walker, AB ;
Herbert, DC .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (07) :680-691
[3]   Monte Carlo simulations of hole transport in SiGe and Ge quantum wells [J].
Crow, GC ;
Abram, RA .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2000, 15 (01) :7-14
[4]   Intersubband electroluminescence from silicon-based quantum cascade structures [J].
Dehlinger, G ;
Diehl, L ;
Gennser, U ;
Sigg, H ;
Faist, J ;
Ensslin, K ;
Grützmacher, D ;
Müller, E .
SCIENCE, 2000, 290 (5500) :2277-+
[5]   Hole transport in strained Si [J].
Dijkstra, JE ;
Wenckebach, WT .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (03) :1259-1263
[6]   EFFECT OF VALENCE-BAND ANISOTROPY AND NONPARABOLICITY ON TOTAL SCATTERING RATES FOR HOLES IN NONPOLAR SEMICONDUCTORS [J].
DUR, M ;
UNTERRAINER, K ;
GORNIK, E .
PHYSICAL REVIEW B, 1994, 49 (19) :13991-13994
[7]   Band structure, deformation potentals, and carrier mobility in strained Si, Ge, and SiGe alloys [J].
Fischetti, MV ;
Laux, SE .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (04) :2234-2252
[8]   EFFECTIVE-MASS HAMILTONIAN AND BOUNDARY-CONDITIONS FOR THE VALENCE BANDS OF SEMICONDUCTOR MICROSTRUCTURES [J].
FOREMAN, BA .
PHYSICAL REVIEW B, 1993, 48 (07) :4964-4967
[9]   SiGe/Si THz laser based on transitions between inverted mass light-hole and heavy-hole subbands [J].
Friedman, L ;
Sun, G ;
Soref, RA .
APPLIED PHYSICS LETTERS, 2001, 78 (04) :401-403
[10]   Theory of the strain-symmetrized silicon-based Ge-Si superlattice laser [J].
Friedman, L ;
Soref, RA ;
Sun, G ;
Lu, YW .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (06) :1029-1034