Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure

被引：18

作者：

Kim, Myoung-Soo ^{[1
]}

Lee, Da-Hyeok ^{[1
]}

Kim, Ki-Bo ^{[1
]}

Jung, Seok-Heon ^{[2
]}

Lee, Jin-Kyun ^{[2
]}

O, Beom-Hoan ^{[1
]}

Lee, Seung-Gol ^{[1
]}

Park, Se-Geun ^{[1
]}

机构：

[1] Inha Univ, Dept Informat Engn, Inchon 402751, South Korea

[2] Inha Univ, Dept Polymer Sci & Engn, Inchon 402751, South Korea

来源：

THIN SOLID FILMS | 2015年 / 587卷

基金：

新加坡国家研究基金会;

关键词：

Poly(1H; 1H; 2H; 2H-perfluorodecyl methacrylate); Micro-contact printing; Silver; Nanowire; Lift-off process; SILVER NANOWIRE ELECTRODES; HIGHLY TRANSPARENT; HYBRID FILMS; CARBON NANOTUBES; SOLAR-CELLS; NETWORK; POLYMER; RESISTANCE;

D O I：

10.1016/j.tsf.2015.02.028

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper describes a lift-off method of Ag nanowire (Ag NW) patterning using a poly(1H, 1H, 2H, 2H-perfluorodecyl methacrylate) polymer (PFDMA) structure as a mask which is prepared by micro-contact printing. Unlike a conventional photoresist mask, the PFDMA polymer is inert to the dispersion solvent of Ag NW. In addition, the hydrofluoroether solvent used for removing the mask layer of patterned PFDMA films after Ag NW deposition does not chemically affect the polyethylene naphthalate (PEN) substrate or poly(3,4-ethylene dioxythiophene): poly(styrene sulfonate) (PEDOT:PSS) coated on Ag NW layer. In this method, Ag NW/PEDOT: PSS composite films were patterned and the effects of the hot-press method were examined to further improve the electrical and optical properties of the composite films. Moreover, the hot-press method at 110 degrees C has an advantage of applying low pressure to make Ag NW/PEDOT:PSS embedded into PEN films compared to that of pressing samples without heating. The ratio of resistance change of patterned and hot-pressed composite film was only below 1% after repeated bending test. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：100 / 105

页数：6