Structural and thermoelectric transport properties of Sb2Te3 thin films grown by molecular beam epitaxy

被引:105
|
作者
Kim, Y [1 ]
DiVenere, A
Wong, GKL
Ketterson, JB
Cho, S
Meyer, JR
机构
[1] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA
[2] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[3] USN, Res Lab, Washington, DC 20375 USA
[4] HKUST, Dept Phys, Kowloon, Hong Kong, Peoples R China
[5] Northwestern Univ, Dept Elect & Comp Engn, Evanston, IL 60208 USA
关键词
D O I
10.1063/1.1424056
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the structural and transport properties of Sb2Te3 thin films prepared by molecular beam epitaxy as a function of the Te/Sb flux ratio during deposition. Both the crystallinity and the transport properties are found to be strongly affected by nonstoichiometry. The most stoichiometric sample (prepared with a Te/Sb ratio of 3.6) had a high degree of crystallinity, high thermopower, and high carrier mobility. However, Sb2Te3 films with excess Sb or Te had poorer crystallinity, reduced magnitude of the thermopower, and reduced mobility as a result of the formation of antisite defects. These antisite defects were able to be reduced by controlling the relative flow rate ratio of Te to Sb during growth. (C) 2002 American Institute of Physics.
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收藏
页码:715 / 718
页数:4
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