Dielectric properties of Ba(Zn1/3Ta2/3)O3 thin films on Pt-coated Si substrates

被引:9
作者
Nedelcu, L. [1 ]
Mandache, N. B. [2 ]
Toacsan, M. I. [1 ]
Vlaicu, A. M. [1 ]
Banciu, M. G. [1 ]
Ioachim, A. [1 ]
Gherendi, F. [2 ]
Luculescu, C. R. [2 ]
Nistor, M. [2 ]
机构
[1] Natl Inst Mat Phys, Multifunct Mat & Struct Lab, Bucharest 077125, Romania
[2] Natl Inst Lasers Plasmas & Radiat Phys, Plasma Phys & Nucl Fus Lab, Bucharest 077125, Romania
关键词
Barium zinc tantalate; Thin films; Pulsed electron beam deposition; Annealing; Dielectric properties; MICROWAVE; CERAMICS; RELAXATION; RESONATORS; GROWTH;
D O I
10.1016/j.tsf.2012.09.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ba(Zn1/3Ta2/3)O-3 (BZT) thin films were grown on Pt-coated Si substrates at 500 degrees C substrate temperatures by pulsed electron beam deposition method and post-annealed at 600 and 650 degrees C for 1 h. The X-ray diffraction patterns indicate that the as-grown films are partially crystallized but single-phase cubic perovskite structure was formed in annealed films. The temperature dependence of the dielectric constant of the BZT films was recorded in the -100 to + 100 degrees C range. The annealing treatment induces a decrease of the temperature coefficient of the dielectric permittivity with an order of magnitude, from 2000 to 100 ppm/degrees C. The influence of the annealing treatments on the temperature behavior of the BZT films was evidenced; a dielectric constant of about 21 at room temperature was obtained for the films annealed at 650 degrees C. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码:112 / 116
页数:5
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