Enhancement of adhesive strength of hydroxyapatite films on Ti-29Nb-13Ta-4.6Zr by surface morphology control

被引：14

作者：

Hieda, Junko ^{[1
]}

Niinomi, Mitsuo ^{[1
]}

Nakai, Masaaki ^{[1
]}

Cho, Ken ^{[1
]}

Gozawa, Tatsuya ^{[2
]}

Katsui, Hirokazu ^{[1
]}

Tu, Rong ^{[1
]}

Goto, Takashi ^{[1
]}

机构：

[1] Tohoku Univ, Inst Mat Res, Dept Biomat Sci, Aoba Ku, Sendai, Miyagi 9808577, Japan

[2] Tohoku Univ, Grad Sch Biomed Engn, Dept Med Mat, Aoba Ku, Sendai, Miyagi 9808579, Japan

来源：

JOURNAL OF THE MECHANICAL BEHAVIOR OF BIOMEDICAL MATERIALS | 2013年 / 18卷

基金：

日本学术振兴会;

关键词：

beta-type titanium alloy; Hydroxyapatite film; Surface morphology; Acid treatment; Adhesive strength; HYDROFLUORIC-ACID TREATMENT; TITANIUM-ALLOY; MECHANICAL-PROPERTIES; IMPLANTS; ROUGHNESS; OSSEOINTEGRATION;

D O I：

10.1016/j.jmbbm.2012.11.013

中图分类号：

R318 [生物医学工程];

学科分类号：

0831 ;

摘要：

Hydroxyapatite (HAp) films were deposited on a beta-type titanium alloy, Ti-29Nb-13Ta-4.6Zr (TNTZ), by metal organic chemical vapor deposition (MOCVD) in order to improve its hard-tissue compatibility. The surface morphologies of TNTZ substrates were changed by acid treatments and mechanical polishing prior to the HAp film deposition. The adhesive strength of the HAp films formed on TNTZ substrates treated with an HF solution increased to twice that of the HAp film deposited on a TNTZ substrate with a mirror-like finish. Complex microstructures with deeply etched grain boundaries, formed on the TNTZ substrates after immersion in the HF solution, were responsible for the increase in the adhesive strength of the HAp film caused by an interlocking effect. The HAp films on TNTZ substrates treated with a H2SO4 solution exhibited lower adhesive strength than HAp films on TNTZ substrates treated with HF solution, regardless of the surface roughness of the substrates. Additionally, acid treatments using HNO3 and H2O2 solutions did not change the surface morphologies of the TNTZ substrates. The complex microstructures with deeply etched grain boundaries and nanosized asperities formed on the TNTZ substrates are important factors in the improvement of the adhesive strengths of HAp films deposited on TNTZ substrates. (C) 2012 Elsevier Ltd. All rights reserved.

引用

页码：232 / 239

页数：8

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