Electrooptic modulation of multisilicon-on-insulator photonic wires

被引:21
作者
Barrios, Carlos Angulo [1 ]
机构
[1] Univ Politecn Valencia, Valencia 46022, Spain
关键词
device modeling; integrated optics; plasma dispersion effect; silicon optoelectronics;
D O I
10.1109/JLT.2006.872277
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper proposes and analyzes electrically modulated submicrometer-size high-index-contrast waveguides (photonic wires) based on a multisilicon-on-insulator (MSOI) platform. Metal-oxide-semiconductor junctions are used to control the effective refractive index of the waveguides. The electrooptic structures are electrically and optically modeled. The performances of the studied configurations are analyzed and compared in terms of phase modulation efficiency, optical losses, and operation speed, and the feasibility of their fabrication is discussed. Calculations indicate that the proposed schemes can be used to achieve highly efficient phase shifters (V pi L pi < 1 V-cm) based on photonic wires on MSOI, with data transmission rates ranging from 3 to 10 Gb/s.
引用
收藏
页码:2146 / 2155
页数:10
相关论文
共 23 条
[1]  
[Anonymous], 1987, PROC SPIE
[2]   Electrooptic modulation of silicon-on-insulator submicrometer-size waveguide devices [J].
Barrios, CA ;
Almeida, VR ;
Panepucci, R ;
Lipson, M .
JOURNAL OF LIGHTWAVE TECHNOLOGY, 2003, 21 (10) :2332-2339
[3]   Modeling and analysis of high-speed electro-optic modulation in high confinement silicon waveguides using metal-oxide-semiconductor configuration [J].
Barrios, CA ;
Lipson, M .
JOURNAL OF APPLIED PHYSICS, 2004, 96 (11) :6008-6015
[4]  
BLAKE J, 2001, ENCY PHYS SCI TECHNO, P805
[5]   Silicon substrates with buried distributed Bragg reflectors for resonant cavity-enhanced optoelectronics [J].
Emsley, MK ;
Dosunmu, O ;
Ünlü, MS .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (04) :948-955
[6]   Photonic-bandgap microcavities in optical waveguides [J].
Foresi, JS ;
Villeneuve, PR ;
Ferrera, J ;
Thoen, ER ;
Steinmeyer, G ;
Fan, S ;
Joannopoulos, JD ;
Kimerling, LC ;
Smith, HI ;
Ippen, EP .
NATURE, 1997, 390 (6656) :143-145
[7]   High-speed silicon electrooptic modulator design [J].
Gan, FW ;
Kärtner, FX .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (05) :1007-1009
[8]   Ultra shallow junction formation and dopant activation study of Ga implanted Si [J].
Gwilliam, R ;
Gennaro, S ;
Claudio, G ;
Sealy, BJ ;
Mulcahy, C ;
Biswas, S .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 237 (1-2) :121-125
[9]   Epitaxy-ready Si/SiO2 Bragg reflectors by multiple separation-by-implanted oxygen [J].
Ishikawa, Y ;
Shibata, N ;
Fukatsu, S .
APPLIED PHYSICS LETTERS, 1996, 69 (25) :3881-3883
[10]   Epitaxial Si/SiO2 low dimensional structures [J].
Ishikawa, Y ;
Shibata, N ;
Fukatsu, S .
THIN SOLID FILMS, 1998, 321 :234-240