RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

被引：10

作者：

Chopade, S. S. ^{[1
]}

Nayak, C. ^{[2
]}

Bhattacharyya, D. ^{[2
]}

Jha, S. N. ^{[2
]}

Tokas, R. B. ^{[2
]}

Sahoo, N. K. ^{[2
]}

Deo, M. N. ^{[3
]}

Biswas, A. ^{[2
]}

Rai, Sanjay ^{[4
]}

Raman, K. H. Thulasi ^{[5
]}

Rao, G. M. ^{[5
]}

Kumar, Niranjan ^{[6
]}

Patil, D. S. ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Laser & Plasma Technol Div, Bombay 400085, Maharashtra, India

[2] Bhabha Atom Res Ctr, Atom & Mol Phys Div, Bombay 400085, Maharashtra, India

[3] Bhabha Atom Res Ctr, High Pressure & Synchrotron Radiat Phys Div, Bombay 400085, Maharashtra, India

[4] RRCAT, Ind Synchrotron Utilizat Div, Indore 452013, Madhya Pradesh, India

[5] Indian Inst Sci, Dept Instrumentat & Appl Phys, Bangalore 560012, Karnataka, India

[6] Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India

来源：

APPLIED SURFACE SCIENCE | 2015年 / 355卷

关键词：

YSZ; RF plasma; MOCVD; Ellipsometry; EXAFS; XANES; OPTICAL-PROPERTIES; INFRARED-SPECTRA; DEPOSITION; ZRO2; Y2O3; YSZ; MICROSTRUCTURE; TEMPERATURE; POLYMORPHS; SUBSTRATE;

D O I：

10.1016/j.apsusc.2015.07.090

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Yttria stabilized zirconia thin films have been deposited by RF plasma enhanced MOCVD technique on silicon substrates at substrate temperature of 400 degrees C. Plasma of precursor vapors of (2,7,7-trimethyl-3,5-octanedionate) yttrium (known as Y(tod)(3)), (2,7,7-trimethyl-3,5-octanedionate) zirconium (known as Zr(tod)(4)), oxygen and argon gases is used for deposition. To the best of our knowledge, plasma assisted MOCVD of YSZ films using octanediaonate precursors have not been reported in the literature so far. The deposited films have been characterized by GIXRD, FTIR, XPS, FESEM, AFM, XANES, EXAFS, EDAX and spectroscopic ellipsometry. Thickness of the films has been measured by stylus profilometer while tribological property measurement has been done to study mechanical behavior of the coatings. Characterization by different techniques indicates that properties of the films are dependent on the yttria content as well as on the structure of the films. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：82 / 92

页数：11

共 37 条

[1] A comprehensive facility for EXAFS measurements at the INDUS-2 synchrotron source at RRCAT, Indore, India [J].

Basu, S. ;

Nayak, C. ;

Yadav, A. K. ;

Agrawal, A. ;

Poswal, A. K. ;

Bhattacharyya, D. ;

Jha, S. N. ;

Sahoo, N. K. .

17TH PAN-AMERICAN SYNCHROTRON RADIATION INSTRUMENTATION CONFERENCE SRI2013, 2014, 493

[2] Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by rf reactive magnetron sputtering [J].

Boulouz, M ;

Boulouz, A ;

Giani, A ;

Boyer, A .

THIN SOLID FILMS, 1998, 323 (1-2) :85-92

[3] Electrical and optical properties of magnetron-sputtered Y2O3 stabilized ZrO2 thin films [J].

Boulouz, M ;

Tcheliebou, F ;

Boyer, A .

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1997, 17 (14) :1741-1748

[4] RESEARCH ON YSZ THIN-FILMS PREPARED BY PLASMA-CVD PROCESS [J].

CAO, CB ;

WANG, JT ;

YU, WJ ;

PENG, DK ;

MENG, GY .

THIN SOLID FILMS, 1994, 249 (02) :163-167

[5] Transparent/translucent polycrystalline nanostructured yttria stabilized zirconia with varying colors [J].

Casolco, S. R. ;

Xu, J. ;

Garay, J. E. .

SCRIPTA MATERIALIA, 2008, 58 (06) :516-519

[6] MOCVD deposition of YSZ on stainless steels [J].

Chevalier, S ;

Kilo, M ;

Borchardt, G ;

Larpin, JP .

APPLIED SURFACE SCIENCE, 2003, 205 (1-4) :188-195

[7] Physical and optical properties of plasma polymerized thin films deposited by PECVD method [J].

Cho, SH ;

Park, ZT ;

Kim, JG ;

Boo, JH .

SURFACE & COATINGS TECHNOLOGY, 2003, 174 :1111-1115

[8] RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition [J].

Chopade, S. S. ;

Barve, S. A. ;

Raman, K. H. Thulasi ;

Chand, N. ;

Deo, M. N. ;

Biswas, A. ;

Rai, Sanjay ;

Lodha, G. S. ;

Rao, G. M. ;

Patil, D. S. .

APPLIED SURFACE SCIENCE, 2013, 285 :524-531

[9] XANES and EXAFS study of the local order in nanocrystalline yttria-stabilized zirconia [J].

Dura, O. J. ;

Boada, R. ;

Lopez de la Torre, M. A. ;

Aquilanti, G. ;

Rivera-Calzada, A. ;

Leon, C. ;

Chaboy, J. .

PHYSICAL REVIEW B, 2013, 87 (17)

[10] On the degradation of zirconia ceramics during low-temperature annealing in water or water vapor [J].

Guo, X .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1999, 60 (04) :539-546

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