Controllable Formation of Zinc Oxide Micro- and Nanostructures via DUV Direct Patterning

被引：24

作者：

Yeh, Chun-Cheng ^{[1
]}

Liu, Hung-Chuan ^{[2
,3
]}

Chuang, Ming-Yen ^{[2
,3
]}

Denzer, Joseph ^{[1
]}

Berling, Dominique ^{[1
]}

Zan, Hsiao-Wen ^{[2
,3
]}

Soppera, Olivier ^{[1
]}

机构：

[1] Univ Haute Alsace, Inst Sci Mat Mulhouse IS2M, CNRS, UMR 7361, 15 Rue Jean Starcky, Mulhouse, France

[2] Natl Chiao Tung Univ, Dept Photon, Hsinchu 30010, Taiwan

[3] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 30010, Taiwan

来源：

ADVANCED MATERIALS INTERFACES | 2016年 / 3卷 / 19期

关键词：

THIN-FILM TRANSISTORS; PHOTOCHEMICAL ACTIVATION; ZNO FILMS; NANOWIRES; LITHOGRAPHY; ENHANCEMENT; ELECTRONICS; EPITAXY; DEVICES; SENSORS;

D O I：

10.1002/admi.201600373

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Various kinds of zinc oxide (ZnO) nanostructures, such as ZnO nanowires, ZnO nanobelts, ZnO nanosheets, and ZnO nanorods are promising building blocks for nanoscale systems. However, to precisely control the size, shape, and to make a controlled assembly of synthesized ZnO nanostructures are major difficulties in the development of bottom-up devices. To overcome the challenge regarding reproducibility and positioning, a new method is proposed, deep ultra-violet (DUV) direct photo-patterning, to create ZnO micro- and nanostructures. A sol-gel formulation sensitive to DUV light and based on zinc methacrylate precursor is developed, and the photoreactions of zinc methacrylate under DUV light are carefully investigated by in situ spectroscopic ellipsometry, in situ FTIR, and XPS analysis. Then, the sol-gel solution is used as a negative tone resist in DUV lithography to evaluate its performance in producing high-resolution patterns. The results indicate that small patterns from micro-to nanoscale can be obtained in a simple and direct way.

引用

页数：12

共 41 条

[1] NOx sensors based on semiconducting metal oxide nanostructures: Progress and perspectives [J].