Electro-optic S-parameter and electric-field profiling measurement of microwave integrated circuits

被引:10
|
作者
Dudley, RA [1 ]
Roddie, AG
Bannister, DJ
Gifford, AD
Krems, T
Facon, P
机构
[1] Natl Phys Lab, Ctr Electromagnet Metrol, Teddington TW11 0LW, Middx, England
[2] DERA, Malvern WR14 3PS, Worcs, England
[3] Fraunhofer Inst Angew Festkorperphys, D-79108 Freiburg, Germany
[4] Direct Industrielle, Dassault Electron, Microwave Dept, F-92214 St Cloud, France
关键词
D O I
10.1049/ip-smt:19990171
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An S-parameter measurement system based on electro-optic sampling for the on-wafer testing of microwave integrated circuits is presented. Conventional network-analyser measurements on passive circuits up to 20GHz are used to establish a calibration and measurement procedure to allow S-21 measurement on further circuits with 0.5 dB uncertainty. Extension of these rules to the noninvasive testing of active microwave circuits, coupling waveguides and digital circuits is demonstrated with a spatial resolution of 8 mu m and submillivolt sensitivity.
引用
收藏
页码:117 / 122
页数:6
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