The Outlook for SiC Vertical JFET Technology

被引:0
作者
Bhalla, Anup [1 ]
Li, Xueqing [1 ]
Alexandrov, Petre [1 ]
Dries, J. Christopher [1 ]
机构
[1] United Silicon Carbide Inc, Monmouth Jct, NJ 08852 USA
来源
2013 1ST IEEE WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS (WIPDA) | 2013年
关键词
POWER;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Excellent Silicon Carbide (SiC) material properties make SiC JFETs extremely attractive for high power density and high frequency power applications, as well as for circuit protection functions. The absence of a gate oxide and internal parasitic devices allows the device to operate especially well at high temperatures. The vertical current flow design of trench JFETs lead to near ideal specific on-resistance when combined with current wafer thinning and laser contact technologies. Device costs are expected to rapidly drop with the maturing of the foundry production model, migration to 6 inch fabrication and the further application of charge-balance technologies. With the availability of integrated drivers, these devices will become much easier to use. Significant packaging improvements will be needed to fully exploit these devices.
引用
收藏
页码:40 / 43
页数:4
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