Numerical simulation of laser-produced plasma devices for EUV lithography using the heights integrated model

Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge for LPP is achieving sufficient brightness to support the throughput requirements of high-volume manufacturing. An integrated model ( HEIGHTS) was applied to simulate the environment of EUV sources and optimize their output. The model includes plasma evolution and magnetohydrodynamic processes in a two-temperature approximation, as well as photon radiation transport determined by the Monte Carlo method. It uses the total variation diminishing scheme for the description of magnetic compression and diffusion in a cylindrical 2-D geometry for the target. Generation of the internal magnetic field with nonparallel density and temperature gradients was also considered. Preliminary results from numerical simulation in hydrodynamics and line radiation output of xenon and tin plasmas are presented for planar and droplet targets.