Plasma limiter for protecting against high power microwave

被引：0

作者：

Yang, Geng ^{[1
]}

Tan, Ji-chun ^{[1
]}

Shem, Ding-yi ^{[1
]}

Yang, Yu-chuan ^{[1
]}

机构：

[1] Natl Univ Def Technol, Coll Sci, Tech Phys Res Inst, Changsha, Hunan, Peoples R China

来源：

JOURNAL OF SCIENTIFIC & INDUSTRIAL RESEARCH | 2008年 / 67卷 / 09期

关键词：

electronic systems; high power microwave; plasma limiter;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Breakdown parameters of plasma limiter are calculated to find new measure to protect electronic systems against high Power microwave (HPM). Limiter filled with Xe of 1 torr can be charged by incident HPM in approximate 14 ns, providing protection to electronic systems.

引用

页码：685 / 687

页数：3