Effect of Additives on Optical Measurements of NiSe2 Thin Films

被引：12

作者：

Anand, T. Joseph Sahaya ^{[1
]}

Zaidan, Mohd ^{[1
]}

Shariza, S. ^{[1
]}

机构：

[1] Univ Tekn Malaysia Melaka, Fac Mfg Engn, Melaka 76109, Malaysia

来源：

MALAYSIAN TECHNICAL UNIVERSITIES CONFERENCE ON ENGINEERING & TECHNOLOGY 2012 (MUCET 2012) | 2013年 / 53卷

关键词：

thin film; photoelectrochemical; nickel selenide; electrodeposition; additive; DEPOSITION; MOLYBDENUM; ELECTRODEPOSITION;

D O I：

10.1016/j.proeng.2013.02.071

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nickel selenide, NiSe2 is one of the absorbent materials used in thin film technology in photoelectrochemical (PEC) cell. Electrodeposition is a preferred method to produce NiSe2 thin films due to its advantages such as the possibility of large scale production, minimum waste of components, easy monitoring of deposition process and large area deposition. Ethylenediaminetetraacetic acid (EDTA) and triethanolamine (TEA) were employed as the additives during the deposition. The samples were deposited within 30 minutes deposition time according to potential acquired from cyclic voltammetry measurements. Thin film thickness measurements, structural studies, optical studies, morphological and compositional analysis as well as Mott-Schottky measurements were carried out. (C) 2013 The Authors. Published by Elsevier Ltd.

引用

页码：555 / 561

页数：7

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