Self-assembled masks for the transfer of nanometer-scale patterns into surfaces:: Characterization by AFM and LFM

A new methodology has been used to create an extensive array of nanometer-sized features. The Ar+ milling of Si/SiOx and gold surfaces covered with a diblock copolymer mask with an intrinsic topological nanopattern yields transfer of the nanopattern. Mask removal was tracked using XPS, and the final arrays were characterized by AFM and LFM. Friction contrast observed throughout the transferred pattern is associated with a surface water layer.