Growth of ZnTe films by pulsed laser deposition technique

被引:24
作者
Ghosh, B. [1 ]
Ghosh, D. [1 ]
Hussain, S. [1 ]
Bhar, R. [1 ]
Pal, A. K. [1 ]
机构
[1] Jadavpur Univ, Dept Instrumentat Sci, Kolkata 700032, W Bengal, India
关键词
ZnTe; PL; PLD; THIN-FILMS; OPTICAL-PROPERTIES; ELECTRICAL-PROPERTIES; ZINC TELLURIDE; DOPED ZNTE; PHOTOLUMINESCENCE; CONSTANTS; CDTE;
D O I
10.1016/j.jallcom.2012.06.063
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Polycrystalline zinc telluride films were successfully deposited on glass substrates at different temperatures ranging from 300 K to 773 K by ablating a ZnTe target (99.99%) by a pulsed laser beam. Microstructural studies indicated an increase in the average crystallite size from 40 nm to similar to 75 nm with the increase in substrate temperature during deposition. X-ray diffraction patterns indicated that structure of the films depended on the deposition temperature. The band gap as determined from the transmittance versus wavelength traces was found to vary between 2.32 and 2.38 eV. The PL spectra measured at 300 K were dominated by a strong peak located at similar to 1.77 eV which overshadowed the band edge luminescence peak at similar to 2.23 eV. Characteristics Raman peaks for ZnTe at similar to 173 cm (1) (TO) and similar to 199 cm (1) (LO) were also observed. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码:104 / 110
页数:7
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