Charge exchange collisions and ion velocity distribution at the electrode of low pressure capacitive rf discharges

被引：29

作者：

Israel, D. ^{[1
]}

Riemann, K. -U.

Tsendin, L.

机构：

[1] Ruhr Univ Bochum, Lehrstuhl Theoret Phys 1, D-44780 Bochum, Germany

[2] St Petersburg State Polytech Univ, St Petersburg 195251, Russia

来源：

JOURNAL OF APPLIED PHYSICS | 2006年 / 99卷 / 09期

基金：

俄罗斯基础研究基金会;

关键词：

D O I：

10.1063/1.2191622

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An analytic theory of the time-averaged ion distribution function (IDF) in the self-consistent sheath field of a low pressure capacitively coupled rf discharge is developed. A reliable simple quantitative description of the ion energy spectra formation is obtained and test calculations of charge exchange cross section reconstructions from IDFs are presented. (C) 2006 American Institute of Physics.

引用

页数：8

共 17 条

[1]

Benoit-Cattin P, 1967, ENTROPIE, V18, P29

[2] ANOMALIES OF ENERGY OF POSITIVE IONS EXTRACTED FROM HIGH-FREQUENCY ION SOURCES . A THEORETICAL STUDY [J].

BENOITCATTIN, P ;

BERNARD, LC .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5723-+

[3] THEORY OF THE RF SHEATH IN THE REGIME BETWEEN THE ION AND ELECTRON-PLASMA FREQUENCIES [J].

BIEHLER, S .

APPLIED PHYSICS LETTERS, 1989, 54 (04) :317-319

[4]

BIEHLER S, 1991, THESIS RUHR U BOCHUM

[5]

Chapman B., 1980, Glow Discharge Processes, sputtering and plasma etching, DOI DOI 10.1063/1.2914660

[6] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J].

DAVIS, WD ;

VANDERSLICE, TA .

PHYSICAL REVIEW, 1963, 131 (01) :219-&

[7] ION DISTRIBUTION-FUNCTIONS BEHIND AN RF SHEATH [J].

FLENDER, U ;

WIESEMANN, K .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (03) :509-521

[8] Comparison of a consistent theory of radio frequency sheaths with step models [J].

Gierling, J ;

Riemann, KU .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (07) :3521-3528

[9] MEASUREMENT OF ION ENERGY-DISTRIBUTIONS AT THE POWERED RF ELECTRODE IN A VARIABLE MAGNETIC-FIELD [J].

KUYPERS, AD ;

HOPMAN, HJ .

JOURNAL OF APPLIED PHYSICS, 1990, 67 (03) :1229-1240

[10]

Lieberman M. A., 1994, Principles of Plasma Discharges and Materials Processing, V1st ed.

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