Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

被引：53

作者：

Andersson, Joakim ^{[1
]}

Ehiasarian, Arutiun P. ^{[2
]}

Anders, Andre ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

[2] Sheffield Hallam Univ, Mat & Engn Res Inst, Sheffield S1 1WB, S Yorkshire, England

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 07期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1063/1.2973179

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states. (c) 2008 American Institute of Physics.

引用

页数：3

共 13 条

[1] Atomic scale heating in cathodic arc plasma deposition [J].

Anders, A .

APPLIED PHYSICS LETTERS, 2002, 80 (06) :1100-1102

[2]

ANDERS A, 2008, APPL PHYS LETT

[3] High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering [J].

Anders, Andre ;

Andersson, Joakim ;

Ehiasarian, Arutiun .

JOURNAL OF APPLIED PHYSICS, 2007, 102 (11)

[4] High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering (vol 102, art no 113303, 2007) [J].

Andersa, Andre ;

Andersson, Joakim ;

Ehiasarian, Arutiun .

JOURNAL OF APPLIED PHYSICS, 2008, 103 (03)

[5] The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge [J].

Bohlmark, J. ;

Lattemann, M. ;

Gudmundsson, J. T. ;

Ehiasarian, A. P. ;

Gonzalvo, Y. Aranda ;

Brenning, N. ;

Helmersson, U. .

THIN SOLID FILMS, 2006, 515 (04) :1522-1526

[6] Ionization of sputtered metals in high power pulsed magnetron sputtering [J].

Bohlmark, J ;

Alami, J ;

Christou, C ;

Ehiasarian, AP ;

Helmersson, U .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (01) :18-22

[7] Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion [J].

Ehiasarian, A. P. ;

Wen, J. G. ;

Petrov, I. .

JOURNAL OF APPLIED PHYSICS, 2007, 101 (05)

[8] Influence of high power densities on the composition of pulsed magnetron plasmas [J].

Ehiasarian, AP ;

New, R ;

Münz, WD ;

Hultman, L ;

Helmersson, U ;

Kouznetsov, V .

VACUUM, 2002, 65 (02) :147-154

[9] Ionized physical vapor deposition (IPVD): A review of technology and applications [J].

Helmersson, Ulf ;

Lattemann, Martina ;

Bohlmark, Johan ;

Ehiasarian, Arutiun P. ;

Gudmundsson, Jon Tomas .

THIN SOLID FILMS, 2006, 513 (1-2) :1-24

[10] Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges [J].

Konstantinidis, S ;

Dauchot, JP ;

Ganciu, M ;

Ricard, A ;

Hecq, M .

JOURNAL OF APPLIED PHYSICS, 2006, 99 (01)

← 1 2 →