Fabrication of zinc oxide nanostructures using solvent-assisted capillary lithography

被引:21
作者
Park, J. W. [1 ]
Kim, J. K. [1 ]
Suh, K. Y. [1 ]
机构
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
关键词
D O I
10.1088/0957-4484/17/10/031
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present a simple solvent-assisted capillary molding method to fabricate zinc oxide (ZnO) nanostructures using an ultraviolet (UV) curable polyurethane acrylate (PUA) mold. A thin film of the ZnO sol-gel precursor solution in methyl alcohol was prepared by spin coating on a solid substrate and subsequently a nanopatterned PUA mold was brought into conformal contact with the substrate under slight physical pressure (similar to 3.5 bar). After annealing at 230 degrees C for 4 h, well-defined ZnO nanostructures formed with feature size down to similar to 50 nm, aided by capillary rise and solvent evaporation. It was found that the height of capillary rise depended highly on the applied pressure. A simple experimental setup was devised to examine the effects of pressure, revealing that the optimum pressure ranged from 3.5 bar to 5 bar. Also, ZnO nanorods could be selectively grown on patterned regions using the seed layer as a pseudocatalyst when the width of the seed layer was larger than similar to 200 nm.
引用
收藏
页码:2631 / 2635
页数:5
相关论文
共 30 条
[1]  
Adamson A.W., 1967, Physical chemistry of surfaces
[2]  
BEDFORD A, 2000, MECH MAT
[3]   Plasma assisted molecular beam epitaxy of ZnO on c-plane sapphire: Growth and characterization [J].
Chen, YF ;
Bagnall, DM ;
Koh, HJ ;
Park, KT ;
Hiraga, K ;
Zhu, ZQ ;
Yao, T .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) :3912-3918
[4]   Periodic array of uniform ZnO nanorods by second-order self-assembly [J].
Chik, H ;
Liang, J ;
Cloutier, SG ;
Kouklin, N ;
Xu, JM .
APPLIED PHYSICS LETTERS, 2004, 84 (17) :3376-3378
[5]   An ultraviolet-curable mold for sub-100-nm lithography [J].
Choi, SJ ;
Yoo, PJ ;
Baek, SJ ;
Kim, TW ;
Lee, HH .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (25) :7744-7745
[6]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[7]   Soft solution route to directionally grown ZnO nanorod arrays on Si wafer; room-temperature ultraviolet laser [J].
Choy, JH ;
Jang, ES ;
Won, JH ;
Chung, JH ;
Jang, DJ ;
Kim, YW .
ADVANCED MATERIALS, 2003, 15 (22) :1911-+
[8]   Room-temperature ultraviolet nanowire nanolasers [J].
Huang, MH ;
Mao, S ;
Feick, H ;
Yan, HQ ;
Wu, YY ;
Kind, H ;
Weber, E ;
Russo, R ;
Yang, PD .
SCIENCE, 2001, 292 (5523) :1897-1899
[9]   Low-pressure nanoimprint lithography [J].
Khang, DY ;
Kang, H ;
Kim, T ;
Lee, HH .
NANO LETTERS, 2004, 4 (04) :633-637
[10]   Fabrication of nanostructures of polyethylene glycol for applications to protein adsorption and cell adhesion [J].
Kim, P ;
Kim, DH ;
Kim, B ;
Choi, SK ;
Lee, SH ;
Khademhosseini, A ;
Langer, R ;
Suh, KY .
NANOTECHNOLOGY, 2005, 16 (10) :2420-2426