X-ray analysis and mapping by wavelength dispersive X-ray spectroscopy in an electron microscope

被引：17

作者：

Tanaka, Miyoko ^{[1
]}

Takeguchi, Masaki ^{[1
]}

Furuya, Kazuo ^{[1
]}

机构：

[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050003, Japan

来源：

ULTRAMICROSCOPY | 2008年 / 108卷 / 11期

基金：

日本科学技术振兴机构;

关键词：

WDS; SEM; STEM; MCX; Boron compounds; W; Si; Elemental mapping;

D O I：

10.1016/j.ultramic.2008.05.011

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

A compact and easy-to-use wavelength dispersive X-ray spectrometer using a multi-capillary X-ray lens attached to a scanning (transmission) electron microscope has been tested for thin-film analysis. B-K spectra from thin-film boron compounds (B4C, h-BN, and B2O3) samples showed prominent peak shifts and detailed structural differences. Mapping images of a thin W/Si double-layer sample resolved each element clearly. Additionally, a thin SiO2 film grown on a Si substrate was imaged with O-K X-rays. Energy and spatial resolution of the system is also discussed. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1427 / 1431

页数：5

共 27 条

[1] Improved quantification of grain boundary segregation by EDS in a dedicated STEM [J].