Enhancement of photodetection characteristics of MoS2 field effect transistors using surface treatment with copper phthalocyanine

被引:104
作者
Pak, Jinsu [1 ]
Jang, Jingon [1 ]
Cho, Kyungjune [1 ]
Kim, Tae-Young [1 ]
Kim, Jae-Keun [1 ]
Song, Younggul [1 ]
Hong, Woong-Ki [2 ]
Min, Misook [1 ]
Leec, Hyoyoung [3 ]
Lee, Takhee [1 ]
机构
[1] Seoul Natl Univ, Dept Phys & Astron, Seoul 08826, South Korea
[2] Korea Basic Sci Inst, Jeonju Ctr, Jeonju 54907, Jeollabuk Do, South Korea
[3] Sungkyunkwan Univ, Ctr Integrated Nanostruct Phys, Inst Basic Sci, Dept Energy Sci, Suwon 16410, South Korea
基金
新加坡国家研究基金会;
关键词
LAYER MOS2; INTEGRATED-CIRCUITS; HIGH-MOBILITY; PHOTOTRANSISTORS; ULTRAVIOLET; GRAPHENE; LENGTH;
D O I
10.1039/c5nr04836b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Recently, two-dimensional materials such as molybdenum disulfide (MoS2) have been extensively studied as channel materials for field effect transistors (FETs) because MoS2 has outstanding electrical properties such as a low subthreshold swing value, a high on/off ratio, and good carrier mobility. In this study, we characterized the electrical and photo-responsive properties of MoS2 FET when stacking a p-type organic copper phthalocyanine (CuPc) layer on the MoS2 surface. We observed that the threshold voltage of MoS2 FET could be controlled by stacking the CuPc layers due to a charge transfer phenomenon at the interface. Particularly, we demonstrated that CuPc/MoS2 hybrid devices exhibited high performance as a photodetector compared with the pristine MoS2 FETs, caused by more electron-hole pairs separation at the p-n interface. Furthermore, we found the optimized CuPc thickness (similar to 2 nm) on the MoS2 surface for the best performance as a photodetector with a photoresponsivity of similar to 1.98 A W-1, a detectivity of similar to 6.11 x 10(10) Jones, and an external quantum efficiency of similar to 12.57%. Our study suggests that the MoS2 vertical hybrid structure with organic material can be promising as efficient photodetecting devices and optoelectronic circuits.
引用
收藏
页码:18780 / 18788
页数:9
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